Special

RnoINT0078762 @ rn6

Intron Retention

Gene
ENSRNOG00000023176 | Kidins220
Description
kinase D-interacting substrate 220 [Source:RGD Symbol;Acc:619949]
Coordinates
chr6:44264782-44265628:+
Coord C1 exon
chr6:44264782-44265025
Coord A exon
chr6:44265026-44265539
Coord C2 exon
chr6:44265540-44265628
Length
514 bp
Sequences
Splice sites
5' ss Seq
CAGGTAAGC
5' ss Score
9.88
3' ss Seq
GTCTCCATGCTTTCTTCCAGGAA
3' ss Score
9.63
Exon sequences
Seq C1 exon
GTCCGAGTTCTGTTTTCAAAGGGCCCTTTTATTGCCATTTTTGCAAGTGATCCGCATATTATCATAAAGGCCATCAACCAGAACCTGAATAGTGTGCTTCGTGACTCAAATATAAACGGACATGACTACATGCGCAATATAGTTCACTTACCAGTTTTTCTTAATAGTCGTGGGCTTAGCAATGCAAGGAAATTCCTTGTAACTTCAGCAACAAACGGGGACATTACATGCTCAGACACCACAG
Seq A exon
GTAAGCGTCAGCCCTACAGTACTCAGGCTTGAAGTAATCTGGAAGGTTTTTTATAGTTTCTCTTTGCCTTGAAAAATGTTTCTATTTTACATCTCTTTAATATCACACAAAACAACCCTGCACACAGTGCTTGTATTGATGACTTCCGTTGCTGAGATGAAACACCATAACCAAGGCAGCGTGTAGAAGGAAGGGTTTATTTCGCTATGGTTCCGAAGGGATAAGACTCCAGCACCGTCATGCAGGGAAGTGTGGCAGTGTGTGGACGGCATGGCGGCTGGAGTAGGAAGTCGAGAGTTCACATCTCACACTGCAAGCAGGAAACAAGAGAGCAAACACAAATGACATGCATCTTCAAACTCTCAAAACCGTCTCTCCGGGGACACACTTCCTCCTCAGGCCTCACCCCAAACCTCCCCAACAACAGCATCAAGTGGGGGCAAGTGCTGAAACTCCCGAGACTCTGGGAGACTCATCTTAACCACCATAGCGCTGTCTCCATGCTTTCTTCCAG
Seq C2 exon
GAACACAGGAGGACACTGACAGAAGAGTTTCACAGAACAGCCTTGGGGAGATGACAAAGCTTGGGAGCAAAACGGCTCTCAACAGAAGG
VastDB Features
Vast-tools module Information
Secondary ID
ENSRNOG00000023176:ENSRNOT00000005858:18
Average complexity
IR
Mappability confidence:
NA
Protein Impact

ORF disruption upon sequence inclusion

No structure available
Features
Disorder rate (Iupred):
  C1=0.073 A=NA C2=0.567
Domain overlap (PFAM):

C1:
PF076939=KAP_NTPase=FE(15.8=100)
A:
NA
C2:
PF076939=KAP_NTPase=FE(5.6=100)


Main Inclusion Isoform:
NA


Main Skipping Isoform:


Other Inclusion Isoforms:
NA


Other Skipping Isoforms:
Associated events
Primers PCR
Suggestions for RT-PCR validation
F:
CGAGTTCTGTTTTCAAAGGGCC
R:
TCTGTTGAGAGCCGTTTTGCT
Band lengths:
327-841
Functional annotations
There are 0 annotated functions for this event


GENOMIC CONTEXT[edit]

INCLUSION PATTERN[edit]